ISO 21079-3:2008标准是一项用于测定含氧化铝、氧化锆和二氧化硅的耐火材料中氧化锆含量的方法。该标准适用于氧化锆含量在5%至45%之间的耐火材料。本标准提供了两种方法:火焰原子吸收光谱法(FAAS)和电感耦合等离子体发射光谱法(ICP-AES)。
FAAS是一种常用的分析方法,它基于原子吸收光谱法,通过测量样品中特定元素的吸收光谱来确定元素的含量。FAAS方法适用于氧化锆含量在5%至20%之间的耐火材料。FAAS方法的优点是简单易行,操作简单,但是它的灵敏度较低,不能测定低浓度的元素。
ICP-AES是一种高灵敏度的分析方法,它基于电感耦合等离子体发射光谱法,通过测量样品中特定元素的发射光谱来确定元素的含量。ICP-AES方法适用于氧化锆含量在5%至45%之间的耐火材料。ICP-AES方法的优点是灵敏度高,可以测定低浓度的元素,但是操作相对复杂。
本标准的结果适用于氧化锆含量在5%至45%之间的耐火材料。在使用FAAS或ICP-AES方法时,应根据样品的特性和要求选择合适的方法。在进行分析之前,应根据标准要求对样品进行预处理,以确保分析结果的准确性和可靠性。
相关标准
ISO 21079-1:2008 Chemical analysis of refractories containing alumina, zirconia, and silica — Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) — Part 1: Flame atomic absorption spectrophotometry (FAAS) method
ISO 21079-2:2008 Chemical analysis of refractories containing alumina, zirconia, and silica — Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) — Part 2: Inductively coupled plasma emission spectrometry (ICP-AES) method
ISO 21079-4:2008 Chemical analysis of refractories containing alumina, zirconia, and silica — Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) — Part 4: X-ray fluorescence (XRF) method
ISO 21079-5:2008 Chemical analysis of refractories containing alumina, zirconia, and silica — Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) — Part 5: Determination of chromium, cobalt, copper, iron, manganese, nickel, and vanadium by atomic absorption spectrometry (AAS) and inductively coupled plasma atomic emission spectrometry (ICP-AES) after aqua regia dissolution
ISO 21079-6:2008 Chemical analysis of refractories containing alumina, zirconia, and silica — Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) — Part 6: Determination of titanium, calcium, magnesium, sodium, potassium, and phosphorus by flame atomic absorption spectrometry (FAAS) and inductively coupled plasma atomic emission spectrometry (ICP-AES) after hydrofluoric acid decomposition